A photoelectron diffraction study of the structure of PF3 adsorbed on Ni{111}

Abstract The technique of scanned energy photoelectron diffraction has been used to study the structure PF 3 adsorbed on a Ni{in111} surface. The molecule adsorbs in an atop site with a NiP separation of 2.07 (± 0.03) A and gives rise to an expansion of the NiNi outermost layer spacing of 0.03 (± 0.05) A.