Development of Periodic and Three-Dimensional Structures in Acrylic-Monomer Photopolymer Materials by Holographic Methods

Obtaining periodic and three-dimensional structures in photopolymer materials is at present a rapidly developing technology. In this work, we report on the results of the studies aimed at using photopolymer materials on the basis of acrylic monomers, which are developed at the Division of Optics of QuantumDimensional Systems at St.Petersburg National Research University of Information Technologies, Mechanics, and Optics [1]. Avoiding the labor-consuming operations of thermal treatment during the formation of large-thickness layers and simplifying post-exposure treatment are the advantages of the above-mentioned materials compared with SU-8 photoresist which is widely used for obtaining polymer structures [2, 3]. Previously, such materials were used for forming the three-dimensional polymer elements by the methods of deep and tone lithography [4]. In this work, we study the possibility of using the holographic methods for developing periodic and three-dimensional polymer structures.