Surface wave excited plasma processing apparatus

A constantly maintaining the generation of uniform plasma over a large area. A plasma source 10 includes a microwave generator, comprising a microwave waveguide 12 and the dielectric block 13, likewise the plasma source 20, a microwave generator, a microwave waveguide 22 and the dielectric block 23 provided. The lid 3 of the chamber 1, fitted with a microwave waveguide 12 and 22 in parallel, disposing the dielectric block 13 and 23 into the chamber 1. By interposing the reflecting plate 30 between the dielectric block 13 and 23, the electromagnetic wave propagating through the dielectric block 13 and 23 (microwave) is prevented from entering each other as a reflected wave. Thus, controlling the plasma source 10, 20 independently. Further, by disposing the side reflectors 40 on the outer peripheral portion of the dielectric block 13 and 23, to form a standing wave of the electromagnetic wave propagating through the dielectric block 13 and 23, a standing-wave mode of surface wave SW uniformly formed in a large area.