Radical-Triggered Cross-Linking for Molecular Layer Deposition of Thermally Stable SiAlCOH Hybrid Thin Films

Here, we report on a simultaneous growth and radical-initiated cross-linking of a hybrid thin film in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited a self-limiting MLD growth behavior and improved properties like 12% higher film density and enhanced stability compared to the non-cross-linked film.