Flexible Electronics: High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells (Adv. Mater. 28/2016)
2016
On page 5939, J. V. Badding and co-workers describe the unrolling of a flexible hydrogenated amorphous silicon solar cell, deposited by high-pressure chemical vapor deposition. The high-pressure deposition process is represented by the molecules of silane infiltrating the small voids between the rolled up substrate, facilitating plasma-free deposition over a very large area. The high-pressure approach is expected to also find application for 3D nanoarchitectures.
Keywords:
- Inorganic chemistry
- Materials science
- Amorphous silicon
- Hybrid physical-chemical vapor deposition
- Thin film
- Monocrystalline silicon
- Combustion chemical vapor deposition
- Polymer solar cell
- Carbon film
- Nanocrystalline silicon
- Chemical vapor deposition
- Chemical engineering
- Amorphous carbon
- Plasma-enhanced chemical vapor deposition
- Nanotechnology
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