Interface Chemistry and Dielectric Optimization of TMA-Passivated high-k/Ge Gate Stacks by ALD-Driven laminated Interlayers.

Die Wang,Gang He,Lin Hao,Lesheng Qiao,Zebo Fang,Jiangwei Liu

Interface Chemistry and Dielectric Optimization of TMA-Passivated high-k/Ge Gate Stacks by ALD-Driven laminated Interlayers.

2020

Die Wang
Gang He
Lin Hao
Lesheng Qiao
Zebo Fang
Jiangwei Liu

In the present study, a comparative study on the influence of different laminated stacks driven by aomic layer deposition (ALD) on the interfacial and electrcial properties of high-k/Ge gate stacks...

Keywords:

Materials science
High-κ dielectric
Deposition (law)
Atomic layer deposition
gate stack
Optoelectronics
Dielectric
Stack (abstract data type)
Inorganic chemistry

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