A demonstration of low voltage performance, from scaled PLZT films, on a fully integrated 64K FRAM®

Abstract One of the prevailing concerns regarding the PLZT based system has been in its scalability for low voltage operation. Through process enhancements, a sputtered PLZT film with Calcium and Strontium dopants, has been optimized on a platinum electrode system and scaled for low voltage operation. This paper will present general background data covering the optimization of the Ferroelectric film and SOIC “Plastic” package results for a fully integrated 64k FRAM® incorporating this film.