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Sige Selective Epitaxial Growth Process for 22 Nm Node CMOS and Beyond
Sige Selective Epitaxial Growth Process for 22 Nm Node CMOS and Beyond
2014
Guilei Wang
Ye Tianchun
Jun Luo
Changliang Qin
Yefeng Xu
Tao Chen
Qiang Xu
Peizhen Hong
Tao Yang
Chunlong Li
Gaobo Xu
Jiahan Yu
Haizhou Yin
Junfeng Li
Jiang Yan
Huilong Zhu
Chao Zhao
Henry H. Radamson
Keywords:
Calculus
Epitaxy
CMOS
Electronic engineering
Materials science
Optoelectronics
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