Process for producing carbonyl difluoride

Provided is a process for efficient, simple and cheap production of carbonyl difluoride, which is an important compound attracting attention as a semiconductor etching gas and a semiconductor cleaning gas. The process for producing carbonyl difluoride includes a step of producing carbonyl difluoride and hydrogen chloride by reacting phosgene and hydrogen fluoride in the gas phase, in the presence of a fluorination catalyst, and a step of mixing a mixture which includes the aforementioned carbonyl difluoride and the aforementioned hydrogen chloride with an organic solvent which forms an azeotrope with hydrogen chloride and does not form an azeotrope with carbonyl difluoride and isolating carbonyl difluoride, by distillation thereof.