Process and Pattern Precision in Nano-imprinting Lithography

By pressing,nano-imprinting lithography technology to complete the pattern transfer of nano-structure is characterized by high resolution,high efficiency and low cost.By analyzing some factors influencing the pattern precision in nano-imprinting,corresponding measures have been proposed.Experiment has been carried out using self-made NIL01 nano-imprinting equipment.Experimental results show that,in considering a variety of factors influencing pattern precision,PMMA pattern with feature size of 100nm can be got in hot embossing through SiO_2 mask coated with Cr and NIL-01 nano-imprint equipment.