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Mechanism for segregation of arsenic dopants at grain boundaries in silicon
Mechanism for segregation of arsenic dopants at grain boundaries in silicon
2021
Yutaka Ohno
Yasuo Shimizu
Jie Ren
Tatsuya Yokoi
Koji Inoue
Yasuyoshi Nagai
Hideto Yoshida
Kentaro Kutsukake
Kozo Fujiwara
Atsutomo Nakamura
Katsushi Matsunaga
Keywords:
Arsenic
Chemical physics
Materials science
Dopant
mechanism
Grain boundary
Silicon
Correction
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