Thermally stimulated flow of low-melting glasses during planarization of the surface profiles of microelectronic structures

The problem of characterizing the flow of phosphorosilicate and borophosphorosilicate glasses during thermally stimulated planarization of the surface profile of microelectronic structures is solved in a model based on Newtonian viscous flow driven by surface tension forces. Expressions are obtained for the melting angle as a function of the temperature-time regimes of the heat treatment and the physical parameters of the glasses.