The study of the light section canal anodic-abrasive polishing mechanism

The development of electronic technology, waveguide transmission lines of electromagnetic energy, as well as precision engineering require the development of polishing technologies. One of these technologies is the method of anodic abrasive polishing (AAP). The causal diagram of the influence of technological parameters on the output characteristics of AAP is presented, as well as the model of the process and the analysis of the mechanism of anodic abrasive polishing at the longitudinal vibration contact with the treated surface and the impact of the pulse current density used for electrochemical polishing of micro-irregularities with the help of a cathode integrated with an elastic abrasive tool