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Reduction in the mask error factor by optimizing the diffraction order of a scattering bar in lithography
Reduction in the mask error factor by optimizing the diffraction order of a scattering bar in lithography
2005
Mi-Ae Ha
Hye-Keun Oh
Keywords:
Physics
Nuclear magnetic resonance
Scattering
Diffraction
Optics
Lithography
error factor
diffraction order
Correction
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