Optical far field measurements applied to microroughness determination of periodic microelectronic structures
2011
With device size reduction, variability induced by local micro roughness is becoming less and less negligible in terms of
statistical control of critical dimensions (CD). We applied a recent approach developed at Fresnel Institute for the
determination of micro roughness on periodic structures through optical far field characterization using an angle resolved
scatterometer. Structure periodicity affects the diffraction orders, while roughness signature is mainly found between
diffraction orders. Theoretical simulation was performed using two in-house computer codes based on differential
method and on first order approximation. We will review the theoretical approach and show roughness data derived from
measurement on glass gratings as well as poly silicon gate type structures.
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