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Plasma enhanced atomic layer deposition of two-dimensional WS2 from WF6, H2S and H2 plasma precursors
Plasma enhanced atomic layer deposition of two-dimensional WS2 from WF6, H2S and H2 plasma precursors
2015
Benjamin Groven
Markus Heyne
Karel Haesevoets
Johan Meersschaut
Thomas Nuytten
Thierry Conard
Patrick Verdonck
Sven Van Elshocht
Marc Heyns
Iuliana Radu
Annelies Delabie
Matty Caymax
Keywords:
Plasma
Plasma processing
Atomic layer deposition
Analytical chemistry
Materials science
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