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Charge trapping properties of alternative high-kappa dielectrics in MOS devices
Charge trapping properties of alternative high-kappa dielectrics in MOS devices
2006
Xing Zhou
Daniel M. Fleetwood
Ronald D. Schrimpf
Robert A. Weller
S.T. Pantelides
Ronald D. Schrimpf
Keywords:
Ionizing radiation
Dielectric
Charge density
Integrated circuit
Optoelectronics
Electronic engineering
Radiation exposure
Materials science
High-κ dielectric
Trapping
Correction
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