A wafer-level heterogeneous technology integration for flexible pseudo-SoC

The MEMS-LSI integration technologies that have been reported are mainly implemented for monolithic integrated System on Chip (SoC) by applying the advantages of process compatibility between MEMS and CMOS LSI [1]. However, it has been impossible to integrate them in the case that MEMS and standard CMOS processes are incompatible. Furthermore, many MEMS-LSI integration technologies applying System in Package (SiP) technology with the interposer substrate to realize electronics devices have been reported. However, using SiP technology, it has not been possible to achieve high integration density comparable to that of monolithic integrated SoC because the interposer substrate occupies a large area in SiP. Accordingly, development of an advanced MEMS-LSI integration technology to realizing highly integrated SoC incorporating MEMS devices is required [2].