Method for preparing functional layer of microchannel plate by utilizing atomic layer deposition technology

The invention provides a method for preparing the functional layer of a microchannel plate by utilizing an atomic layer deposition technology to overcome the inherent defects of preparing a functional layer by utilizing the traditional hydrogen reduction technology, for the microchannel plate and solve the problems of complex preparation, instability in property, short life and the like of the functional layer of the microchannel plate. According to the method, a resistance layer and an emission layer which have the advantages of high adhesive force, smoothness in surface, uniformity in thickness and high purity of compositions are prepared, so that the property stability of the microchannel plate is enhanced, and the working life of the microchannel plate is prolonged.