Complete Imageless solution for overlay front‐end manufacturing

Imageless option of KLA‐Tencor RDM system (Recipe Data Management) is a new method of recipe creation, using only the mask design to define alignment target and measurement parameters. This technique is potentially the easiest tool to improve recipe management of a large amount of products in logic fab. Overlay recipes are created without wafer, by using a synthetic image (copy of gds mask file) for alignment pattern and target design like shape (frame in frame) and size for the measurement. A complete gauge study on critical CMOS 90nm Gate level has been conducted to evaluate reliability and robustness of the imageless recipe. We show that Imageless limits drastically the number of templates used for recipe creation, and improves or maintains measurement capability compare to manual recipe creation (operator dependant). Imageless appears to be a suitable solution for high volume manufacturing, as shown by the results obtained on production lots.