3D Si aperture-plates combined with programmable blanking-plates for multi-beam mask writing
2009
Multi-beam lithography is considered a promising fabrication technology for future node mask making. Due to rising
design complexity and therefore increasing pattern writing times the multi-beam approach has distinguished throughput
advantages compared to state of the art variable shaped beam pattern generators.
A key component of a projection multi-beam writing tool is the programmable blanking-plate for generating the desired
pattern geometry on the mask substrate.
In our case a highly parallel charged particle beam illuminates a Si aperture-plate which shapes and generates many
thousand individual spot beams. These beams pass through a blanking-plate with integrated CMOS electronics for demultiplexing
the writing data. The blanking-plate is equipped with blanking and ground electrodes placed around the
apertures switching the beams "on" or "off", dependent on the desired pattern. The beam array is demagnified by a 200x
reduction optics and the exposure of the mask substrate is done in stripes by a continuous moving stage [1,2].
Cross talk between adjacent beams in the blanking-plate has to be avoided to ensure adequate pattern fidelity and line
edge roughness on the mask substrate. One solution is the insertion of a 3D Si aperture-plate in proximity to the
blanking- plate shielding the blanking electrodes from each other during operation.
We developed and characterized a new process flow for the fabrication of these 3D Si aperture-plates for the case of 43
thousand beams in parallel and will present and discuss the cross talk results for blanking-plates combined with standard
2D and new 3D Si aperture-plates.
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
1
References
0
Citations
NaN
KQI