用于HBT的AlGaAs/GaAs MOVPE材料
2005
AlGaAs/GaAs Heterostructure Bipolar Transistor (HBTs) wafers were grown using LP-MOVEPE. Carbon tetrachloride (CCl4) was used as a P-type dopant for the base layer doping. The space layer with a thickness of 3~5 nm can largely reduce the deviation of base-emitter P-N junction relative to the AlGaAs/GaAs heterojunction. The parameters of the HBT made by the wafers is as follows:β=20~35, ƒ(subscript T)>50 GHz, ƒ(subscript max)>60 GHz. The output power of X band power device >5 W.
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