Old Web
English
Sign In
Acemap
>
Paper
>
A sensitive positive resist for 0.1-μm electron-beam direct-writing lithography
A sensitive positive resist for 0.1-μm electron-beam direct-writing lithography
1997
Tadashi Arai
Toshio Sakamizu
Kohji Katoh
Michiaki Hashimoto
Hiroshi Shiraishi
Keywords:
Organic chemistry
Photochemistry
Cathode ray
Electron-beam lithography
Lithography
Resist
Materials science
Analytical chemistry
direct writing
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]