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Low temperature plasma-enhanced ALD of vanadium nitride as copper diffusion barrier
Low temperature plasma-enhanced ALD of vanadium nitride as copper diffusion barrier
2013
Geert Rampelberg
Kilian Devloo-Casier
Davy Deduytsche
Marc Schaekers
Nicolas Blasco
Christophe Detavernier
Keywords:
Plasma
Copper
Inorganic chemistry
Diffusion barrier
Vanadium nitride
Nitride
Materials science
low temperature plasma
Correction
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