Porous thin films for thermal barrier coatings

Abstract A new approach is described in the deposition of thin films for thermal barrier applications. Using controlled substrate motion, porous layers and capping layers were vacuum deposited in an alternating fashion, creating a new, multilayered film structure. Direct measurements of the thermal properties of these multilayers were made using the 3ω and Mirage techniques. In the 3ω technique, heat is introduced into the coating by an AC current flowing through an evaporated resistor with a frequency ω. A fit of resistor voltage as a function of frequency yields the thermal conductivity. In the Mirage technique, an oscillating temperature is induced immediately above the film using a pulsed laser. A second probe laser aligned parallel to the surface is deflected by these temperature variations, and the thermal diffusivity is then found by fitting amplitude and phase shift data to the solution of the three-dimensional diffusion equation. Typically, the 3ω and Mirage techniques measure thermal constants in directions normal and parallel to the substrate, respectively. Measurements using these methods led to estimates of a reduction in thermal diffusivity of as little as 9% of that of films deposited entirely at normal incidence. Thermal simulations of similar structures also predicted a substantial decrease in overall thermal conductivity. In a specific case, an improved conductivity of 18% of that of films deposited by standard techniques was estimated.