Old Web
English
Sign In
Acemap
>
Paper
>
Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WNx Gate Formation
Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WNx Gate Formation
1999
Masaru Moriwaki
Takayuki Yamada
Yoshinao Harada
Shinji Fujii
Michinari Yamanaka
Keywords:
Metal gate
Gate oxide
Nanotechnology
Electronic engineering
Materials science
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
10
Citations
NaN
KQI
[]