Thickness, structural and optical properties of electrodeposited NiO thin films

Abstract Nickel Oxide received great deal of attention due to its excellent combination of physical and chemical properties which make them interesting for numerous fields like electrochemistry, catalysis, corrosion, spintronics and optoelectronics. Nickel Oxide is an excellent semiconductor considered for several applications. In this work, electrochemical deposition of Nickel Oxide thin films on Tin Oxide substrate. The method of weight difference is used to estimate thickness value of the deposited films. Structural properties showed that the deposited films have polycrystalline nature. Optical properties showed that the prepared films have band gap value around 3.32 eV.