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The Properties of Atomic Layer Deposited Al-Doped ZnO Films Using H 2 O and O 3 As Oxidants
The Properties of Atomic Layer Deposited Al-Doped ZnO Films Using H 2 O and O 3 As Oxidants
2015
Min Yi Kim
Young Joon Cho
Hyo Sik Chang
Keywords:
Analytical chemistry
Doping
Materials science
Inorganic chemistry
Chemical engineering
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