Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography

A 2-methoxynaphthalene dimer system is demonstrated as a sequential two photon photoacid generator for double exposure (DE) lithography. DE is based on the use of staggered exposures and is proposed as a replacement for conventional optical lithography. The linear behavior of conventional resist materials disqualifies their use in DE photolithography. The design of reversible nonlinear responsive materials is therefore required.