Formation of Micrometer Scale Metal Structures on Glass by Selective Electroless Plating on Photopatterned Titanium and Copper Containing Films

A procedure for formation of catalytic SiO2 substrate adhesive layer patterns and selective electrochemical metal deposition on the catalyst images was investigated. A photoreactive solution containing a diazonaphthoquinone sulfonate ester and Ti and Cu complexes was developed to deposit Cu catalyst–TiO2 adhesive layer latent images on glass. Sub-micrometer/micrometer scale positive tone photoactive TiCu complex film patterns were formed using a conventional photolithography technique. The Cu ions in 40–50 nm thick Ti and Cu oxide layers formed by pyrolysis of the TiCu complex films were reduced, residual Cu displaced with Pd then the porous Ti oxide structure filled and plated with Cu by selective electroless then electrolytic plating. Annealing the Cu plating filled TiO2 layers on glass resulted in formation of a smooth Ti3+/Cu1+ oxide interface that enabled formation of 20 μm thick Cu deposits on glass substrate with up to 1 kN/m adhesion strength. The adhesion strength was attributed to chemical bondi...