A comprehensive review of the Fenton-based approaches focusing on landfill leachate treatment

2021 
Landfilling is the most commonly adopted method for a large quantity of waste disposal. But, the main concern related to landfills is the generation of leachate. The leachate is high strength wastewater that is usually characterized by the presence of high molecular recalcitrant organics. Several conventional methods are adopted for leachate treatment. However, these methods are only suitable for young leachate, having high biodegradability and low toxicity levels. The mature and stabilized leachate needs advanced technologies for its effective treatment. Advanced oxidation processes (AOPs) are very suitable for such complex wastewater treatment as reported in the literature. After going through the literature survey, it can be concluded that Fenton-based approaches are effective for the treatment of various high/low strength wastewaters treatment. The applications of the Fenton-based approaches are widely adopted and well recognized due to their simplicity, cost-effectiveness, and reliability for the reduction of high chemical oxygen demand (COD) as reported in several studies. Besides, the process is relatively economical due to fewer chemical, non-sophisticated instruments, and low energy requirements. In this review, the conventional and advanced Fenton' s approaches are explained with their detailed reaction mechanisms and applications for landfill leachate treatment. The effect of influencing factors like pH, the dosage of chemicals, nature of reaction matrix, and reagent ratio on the treatment efficiencies are also emphasized. Furthermore, the discussion regarding the reduction of chemical oxygen demand (COD) and color, increase in biodegradability, removal of humic acids from leachate, combined processes, and the pre/post-treatment options are highlighted. The scope of future studies is summarized to attain sustainable solutions for restrictions associated with these methods for effective leachate treatment.
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