The substrate processing apparatus, a manufacturing method and a vaporizer of a semiconductor device

Heating a reaction chamber for processing a substrate, and a vaporization vessel which the treatment liquid is supplied containing hydrogen peroxide or hydrogen peroxide and water, a treatment liquid supply unit for supplying a processing liquid to the vaporization vessel, the evaporation vessel a heating unit, a vaporizer having a supply gas supply the generated process gas into the reaction chamber in the vaporizer, and an exhaust portion for exhausting the atmosphere in the reaction chamber, the heating unit is the evaporation vessel while heating, and a control unit for the processing liquid supply unit controls the process liquid supply unit and the heating unit to supply the processing liquid to the vaporization vessel.