Apparatus for process chamber and method for processing substrate

PURPOSE: A process chamber and a substrate processing method are provided to improve a thin film property by supplying a plasma generating device. CONSTITUTION: A plurality of substrates are separately laminated on a boat(300). A lower chamber housing(200) has a first inner space. An upper chamber housing(100) has a second inner space. A process gas spray device individually sprays process gas in a horizontal direction. A process gas exhaust device is formed on the sidewall of a gas spray hole. [Reference numerals] (AA,BB) Substrate