プラズマ MOCVD によるフェライト薄膜の高速堆積

Oxide thin films of NiyZnxFe3-x-yO4 (0≤x+y≤1.0) were prepared with high deposition rates of 200∼300nm/min by plasma-enhanced MOCVD from mixed gas containing Fe (C5H7O2)3, Zn(C5H7O2)2, Ni (C5H7O2)2, and O2, at a RF power≥400W and temperature=600°C under high flow-rate conditions of source vapors, such as 2.35×10-5 mol/min for the Fe source. The XRD patterns of the films indicated that ZnxFe3-xO4 (0≤x≤0.8), NiyFe3-yO4 (0≤y≤1.0) and Ni0.4Zn0.4Fe2.2O4 films consisted of only a spinel phase with good crystallinity. However, a small (111) peak of NiO was found with the spinel peaks in the XRD pattern of the Ni0.8Zn0.2Fe2.0O4 film. SEM images of the films showed that they had densely columnar structures, irrespective of their compositions.