Correlation between interface structure and giant magnetoresistance in electrodeposited Co–Cu/Cu multilayers

Abstract An attempt has been made to understand the correlation between the interface structure and the giant magnetoresistance (GMR) properties of electrodeposited Co–Cu/Cu multilayers by measurements performed on a series produced by galvanostatic electrodeposition under the application of different capacitances connected parallel to the electrochemical cell, and this was expected to increase the width of the chemically intermixed interface between the magnetic and non-magnetic layer. In contrast to expectation, the GMR values of multilayers electrodeposited in the presence of a capacitance remained nearly unchanged even at the highest applied capacitance value, as a consequence of immiscibility of alloying elements.