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Update of development progress of the high power LPP EUV light source using a magnetic field
Update of development progress of the high power LPP EUV light source using a magnetic field
2020
Gouta Niimi
Shinji Nagai
Tsukasa Hori
Yoshifumi Ueno
Tatsuya Yanagida
Kenichi Miyao
Hideyuki. Hayashi
Yukio Watanabe
Tamotsu Abe
Hiroaki Nakarai
Takashi Saito
Hakaru Mizoguchi
Keywords:
light source
Optics
Physics
Magnetic field
Extreme ultraviolet lithography
Correction
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