Vacuum control system and a vacuum control method

The invention relates to a technique for controlling the gas flow in a vacuum chamber. The invention provides a vacuum control system using a vacuum pump to control a vacuum pressure and a flow of a processing gas in a vacuum chamber (500). The vacuum chamber is for processing on an object with the processing gas provided from a gas supply unit. The vacuum control system includes: a plurality of vacuum control valves, a pressure measurement unit, and a controller. Each of the plurality of vacuum control valves is connected between each of a plurality of gas discharge ports and the vacuum pump. The plurality of gas discharge ports is disposed in different positions of the vacuum chamber. The pressure measurement unit is configured to measure the vacuum pressure of the processing gas supplied to the object. The controller is configured to manipulate respective openings of the valves in accordance with the measured vacuum pressure.