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Photoacid Diffusion in Chemically Amplified DUV Resists
Photoacid Diffusion in Chemically Amplified DUV Resists
1998
Toshiro Itani
Hiroshi Yoshino
Shuichi Hashimoto
Mitsuharu Yamana
Norihiko Samoto
Kunihiko Kasama
Keywords:
Photoacid
Photochemistry
Resist
Chemistry
Materials science
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