Thin Film Solar Cell based on Microcrystalline Silicon Nanostructure grown in Low Temperature Condition

In this meeting, we present the recent developments in thin film silicon solar cell research conducted by interdisciplinary efforts at Seoul National University. High quality microcrystalline silicon thin films for solar cell applications are grown by Hot-Wire Chemical Vapor Deposition (HWCVD) in low temperature condition. In an effort to control the crystalline fraction of silicon films, the effect of HCl addition is studied, and it is confirmed by Raman spectra that the increasing amount of HCl results in higher crystalline silicon fraction in the deposited films. Electrical and optical properties of p-type/n-type hydrogenated microcrystalline silicon (μc-Si:H) films are characterized with various B2H6 and PH3 gas ratios. The best p-type/n-typelayer producing operation condition and film properties are determined.