Spin Coated YSZ Thin Films on Silicon Substrate

2012 
Yttria Stabilized Zirconia (YSZ) thin films (<10 μm) were fabricated by spin coating technique on silicon (Si). Parameters such as concentration ratio of YSZ powder to solvent were varied accordingly. The effects of these variations were investigated and discussed. Using X-ray Diffraction and Raman Spectroscopy, the crystal structure of the samples were determined. The 8-YSZ thin films have cubic fluorite structure. The X- ray diffraction patterns were in agreement with the samples' Raman spectra. Pores were evident on single coated substrates but were minimized using higher YSZ concentration. Index Terms—Yttria Stabilized Zirconia,YSZ, spin-coating, thin film ——————————  ——————————
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