Photocatalytic activity of nanostructured TiO2 and N-TiO2 thin films deposited onto glass using CA-PVD technique

In this paper we investigate the possibility of formation of Anatase TiO2 and nitrogen doped TiO2thin films prepared by varying cathodic arc evaporation parameters such as ratio of Ar, O2 and N2 gas flow, bias voltage and cathode current. Nanostructured titanium dioxide (TiO2) and nitrogen doped titanium dioxide (N-TiO2) thin films were deposited on soda lime silicate glass samples using Cathodic Arc Physical Vapor Deposition (CA-PVD). X-ray diffraction (XRD), UV-Vis spectrophotometer and scanning electron microscope (SEM) technologies were used to characterize the film. The photocatalytic activities of the samples were tested on the degradation of methylene blue (MB) dye. Crystalline size and phases of the thin films were calculated by using XRD. Morphology and elemental analysis of the thin films were carried by SEM-EDAX. Here, we intensely say that as deposited thin films gives better degradation efficiency without any additional process.In this paper we investigate the possibility of formation of Anatase TiO2 and nitrogen doped TiO2thin films prepared by varying cathodic arc evaporation parameters such as ratio of Ar, O2 and N2 gas flow, bias voltage and cathode current. Nanostructured titanium dioxide (TiO2) and nitrogen doped titanium dioxide (N-TiO2) thin films were deposited on soda lime silicate glass samples using Cathodic Arc Physical Vapor Deposition (CA-PVD). X-ray diffraction (XRD), UV-Vis spectrophotometer and scanning electron microscope (SEM) technologies were used to characterize the film. The photocatalytic activities of the samples were tested on the degradation of methylene blue (MB) dye. Crystalline size and phases of the thin films were calculated by using XRD. Morphology and elemental analysis of the thin films were carried by SEM-EDAX. Here, we intensely say that as deposited thin films gives better degradation efficiency without any additional process.