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Fabrication of α-Ir 2 O 3 thin film using O 3 gas by mist CVD
Fabrication of α-Ir 2 O 3 thin film using O 3 gas by mist CVD
2019
Yasuhisa Masuda
Kentaro Kaneko
Takashi Shinohe
Shizuo Fujita
Keywords:
Chemical engineering
Fabrication
Thin film
Mist
Materials science
Iridium oxide
Correction
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