Studies on Preparation and Characterization of NIR Antireflection Thin Films

Abstract In this study, preparation of different designs of thin films by physical vapour deposition (PVD) with the help of MgF 2 and YF 3 materials of low and medium refractive index on the BK-7 glass substrate at Near Infra Region (NIR) with quarter wave thickness of 963 nm (0.9 um) is presented. The structural and optical properties of MgF 2 /YF 3 thin films produced by PVD technique have been investigated. Transmission is found to vary continuously with layer thickness. The optical transmittance at normal incidence was obtained in the wavelength range 500-2000 nm by using UV/VIS/NIR spectrophotometer. The crystalline nature and orientation of the MgF 2 /YF 3 thin films have been systematically investigated at room temperature by X-ray diffraction patterns (XRD). The surface morphology studies of Roughness (Ra), RMS, Grain size were investigated systematically by Atomic Force Microscope (AFM).