Formation of upper layer film composition, upper layer film and a pattern forming method

PROBLEM TO BE SOLVED: To provide an upper layer film-forming composition to be used for an immersion lithography method, the composition capable of improving a depth of focus and giving a good pattern, and to provide an upper layer film obtained from the upper layer film-forming composition, and a pattern forming method using the upper layer film. SOLUTION: The upper layer film-forming composition to be used for forming an upper layer film on the surface of a photoresist film contains: a resin component (A) that dissolves in a developing solution for developing the photoresist film; and an amide group-containing compound (B). COPYRIGHT: (C)2010,JPO&INPIT