Method and apparatus for depositing thin layers

The invention provides a deposition apparatus is provided, which even permits a significant reduction in the total gas consumption, a simplification of the overall structure and cost reduction of the apparatus when the gas into a plurality of thin-film production rooms (20a, 20b) is fed. The device has a plurality of thin-film production rooms (20) for making each of the same thin film. In each of these thin-film production rooms source gas supply ports (10) are present, can be supplied through the at least one source gas. Of at least one (20a) of the plurality of thin-film production rooms, a discharge gas may have a different (20b) are fed in the same by at least one outlet gas flow path (14). In the first-mentioned thin film Herstellraum (20a) a diluent gas is fed, and the outlet gas is discharged from an outlet leading to the outside (9) of the other thin-film Herstellraums (20b) to the outside.