Novel synthetic aqueous photoresist for CCD micro color filter

A novel synthetic aqueous photoresist has been developed for CCD micro color filters. The resist consists of four-components methacrylate copolymers as a resin and diazo compound as a photosensitizer. The resist uses water as a solvent and a developer. The performance characteristics of this resist are the sensitivity of less than 100 mJ/cm 2 , the contrast of more than 8 ((gamma) value), the resolution of less than 1.5 micrometers lines and spaces, the thermal stability of 250 degree(s)C (the transmittance of more than 90% at visual wavelength) and the shelf life of more than 10 days at 23 degree(s)C. It is easily dyed and dyefixed. Micro color filters for 1/4 inch CCD successfully fabricated by using this resist.