Old Web
English
Sign In
Acemap
>
Paper
>
Fabrication of Sub 3 nm Feature Size Based on Block Copolymer Self Assembly for Next-Generation Nanolithography
Fabrication of Sub 3 nm Feature Size Based on Block Copolymer Self Assembly for Next-Generation Nanolithography
2018
K.-B. Lee
Jongheon Kwak
Avnish Kumar Mishra
Jin Kon Kim
Keywords:
Nanolithography
Self-assembly
Nanotechnology
Copolymer
Materials science
Correction
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]