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Double-doped In0.35Al0.65As/In0.35Ga0.65 As power heterojunction FET on GaAs substrate with 1 W outp
Double-doped In0.35Al0.65As/In0.35Ga0.65 As power heterojunction FET on GaAs substrate with 1 W outp
1999
Walter Contrata
Nao Iwata
Keywords:
Chemistry
Analytical chemistry
Heterojunction
Surface roughness
Electronic engineering
Substrate (chemistry)
Breakdown voltage
Doping
Power-added efficiency
Correction
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