Plasma-chemical coating device

Plasma Dry coating apparatus comprising a plasma chamber (15) within the at least one linear antenna (5; 5 ') is arranged for generating a plasma by means of electromagnetic power, in which opens an inlet (11) for a carrier gas and a plasma discharge opening (17) in having the direction of a machining space (19) for a plasma-assisted modification of a substrate (13), characterized in that the plasma discharge opening (17) embodied as elongated waist and on both sides of mutually parallel cylinders (8; 8 ') is limited, the about their respective is provided, in which a (to clean the area of ​​the outer circumferential surface of the cylinder axis of the cylinder can be rotated, and that a feed in a range beyond the waist (3; 3 ') is provided on a layer of gas, and that a cleaning zone (18 18') can be 8 ') are introduced by rotating around the cylinder axis;. 8