Characterization of 45° Micromirrors Fabricated by Silicon Anisotropic Etching in Solutions Containing Different Organic Additives☆

Abstract The possibility of fabrication of micromirrors inclined towards silicon substrate at 45 is studied. The 45 micromirrors are formed by {110} sidewall planes in the Si (100) wafer by anisotropic etching in alkaline solutions containing surface active compounds such as Triton X-100 surfactant and isopropyl alcohol. The quality of {110} surfaces etched in solutions of different compositions is examined. Although in the KOH solution containing alcohol the {110} surface is rather rough, addition of Triton X-100 surfactant to the KOH etchant significantly improves the surface smoothness. The fabricated 45 micromirrors are also compared in respect of their optical properties.